Service contracts for KM Labs EUV HHG laser system
- Est. solicitation
- —
- Date posted
- —
- Source
- Open forecast
Description
We will use scatterometry to benefit advanced integrated circuits (IC) manufacturing. We propose to develop novel extreme ultraviolet (EUV) optics, tabletop sources, and methodologies for inspection and process control. This project will innovate novel approaches to utilizing the 10 nm to 150 nm spectral range for chemical and dimensional characterization of leading-edge technologies over the next decade. NIST is uniquely positioned as our SURF III synchrotron is an optimal source for this radiation, allowing parallel work on metrological aspects with an in-lab compact source. Through a combination of ten times greater spatial resolution in each dimension and the ability to penetrate materials using shorter wavelengths, we will achieve an increase in the information gathered through fast optical techniques by a factor of 1000. We will proactively transfer these technologies to U.S. industry through existing and expanded relationships.
Planning details
- Estimated value
- $250K - $499K
- Contract type
- Unknown
Classifications
- NAICS334413
- PSC334413