RF Waveform and Rapid Frequency-Comb Diagnostics for Plasma Etching

Obtain scientific services to support fundamental metrology research for the development and operation of advanced optical diagnostics for plasma etching processes under the CHIPS R&D Metrology program project 5.04, “RF Waveform and Rapid Frequency-Comb Diagnostics for Plasma Etching.” The Contractor shall provide technical services for plasma etch chamber assembly and operation, in situ optical diagnostics, temporally and spatially resolved optical emission spectroscopy, mid-infrared laser absorption spectroscopy, Langmuir probe measurements, data processing and interpretation, correlation of diagnostic results with time-resolved frequency-comb and radio frequency (RF) waveform measurements, model validation support, and preparation of technical materials for NIST review and dissemination.

Estimated value

$250K - $499K

Contract type

Unknown

• NAICS541690
• PSC541690