High Resolution chromatography and mass spectrometry

Semiconductor manufacturing yield enhancement requires ongoing risk analysis of cleaning chemical purity wherein critical contaminants are already at levels difficult or impossible to detect, let alone identify and quantify. Next generation chips will require even purer materials and advanced metrological capabilities for the detection, identification, and quantification of impurities in semiconductor cleaning chemicals necessitating a practical roadmap for assessing material purity commensurate with the needs of the next generation in semiconductor manufacturing. To this end, three projects addressing different components of this theme are proposed: organic contaminant identification and quantification, native particulates and precursors and rapid surface particle-, and impurity detection and quantification in water/non-water solvents.

Estimated value

$1M - $1.9M

Contract type

Unknown

• NAICS334413
• PSC334413