vector signal generator/arbitrary waveform

Plasma etching—performed across the semiconductor manufacturing ecosystem—is a highly nonlinear process involving arbitrary radiofrequency (RF) waveforms, dynamic electrical properties, and complex chemistry in a confined non-equilibrium environment. Metrology tools are needed to better correlate reactor inputs with etching outcomes, and to precisely evaluate consistency across plasma etching tools. To do so, we will develop RF waveform metrology and µs time-resolved frequency comb diagnostics to meet industry needs including reliable RF calibration, in-situ monitoring of plasma chemistry, and real-time data generation for intelligent design of next-generation plasma etching processes.

Estimated value

$250K - $499K

Contract type

Unknown

• NAICS334413
• PSC334413