Boulder EUV Source Use (Budget Mod Eval)

Extreme ultraviolet (EUV) light is critical technology for modern semiconductor manufacturing, but there are no standards for EUV light characterization, in particular power and energy, at industrial conditions. EUV lithography is required for fabrication of advanced semiconductor chips and requires the generation of 100s of Watts of EUV light. EUV lithography requires support tools, such as reflectivity and transmission measurements, that also require generation of EUV light, but at lower powers and energies. The work in this proposal will empower NIST to work with industry to create relevant power and energy measurement capabilities for the present and future.

Estimated value

$500K - $999K

Contract type

Unknown

• NAICS334413
• PSC334413