Sources Sought Notice of Intent to Sole Source for Preventative Maintenance on a Chemical Mechanical Planarization System (CMP)

See attached Sources Sought Notice of Intent to Sole Source for Preventative Maintenance on a Chemical Mechanical Plantarization System (CMP).

• NAICS811210
• PSCJ066

• Combined SSN and NOI to Sole Source.docx

  .docx37 KBNot yet available

• Elizabeth Timberlake
  elizabeth.timberlake@nist.gov
• Tracy Retterer
  tracy.retterer@nist.gov